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UMC 0.135µm Embedded High Voltage Process |
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UMC L135 Embedded High Voltage Process |
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UMC L135 Embedded High Voltage Process Features |
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FSQ0V_D_GENERIC_CORE |
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- UMC 0.135 µm Embedded High Voltage process
- 230,000 gates/mm 2 raw gate density offers the density needed for applications with ultra-high density and porosity
- All inputs are gated and all cells are static
- Area-efficient circuit/layout style
- Supports a complete set of models for industry-standard EDA tools
- Supports characterization range of 1.5 V ± 10%
- Operating temperature range: -40 °C ~ 125 °C
- All the flip-flops have the corresponding scan cells
- View Details
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