UMC 0.135µm Embedded High Voltage Process
  UMC L135 Embedded High Voltage Process
 
  • FSQ0V_D_GENERIC_CORE
   
UMC L135 Embedded High Voltage Process Features
  FSQ0V_D_GENERIC_CORE
 
  • UMC 0.135 µm Embedded High Voltage process
  • 230,000 gates/mm 2 raw gate density offers the density needed for applications with ultra-high density and porosity
  • All inputs are gated and all cells are static
  • Area-efficient circuit/layout style
  • Supports a complete set of models for industry-standard EDA tools
  • Supports characterization range of 1.5 V ± 10%
  • Operating temperature range: -40 °C ~ 125 °C
  • All the flip-flops have the corresponding scan cells
  • View Details